Improved Strain-Free GaN Growth with a Nearly Lattice-Matched AlInN Interlayer by Metalorganic Chemical Vapor Deposition

Abstract

Using metalorganic chemical vapor deposition, a strain-free GaN layer has been successfully grown by employing a 40-nm-thick nearly lattice-matched (NLM) Al1-xInxN as an interlayer. The Al1-xInxN interlayers having an InN molar fraction of x∼0.11 and 0.13 led to crack-networking at the GaN surface due to excessive tensile strain by lattice-mismatching. In the case of the GaN layer with a NLM Al1-xInxN interlayer (x∼0.18), however, strain-free GaN structure with improved structural and optical properties was demonstrated from the results of atomic force microscopy, Raman scattering and photoluminescence. By using transmission electron microscopy (TEM), the origin on strain-free state and improved properties of the GaN layer with the NLM AlInN interlayer was investigated. Based on TEM observations, we suggest that the faulted zone-like growth mechanism on roughed AlInN surface and partial compensation of tensile thermal stress are major factors on the improved strain-free GaN film.