Improved sputtering method to deposit high conducting doped ZnO films without substrate heating

Abstract

Magnetron sputtering deposition with Zn supply was utilized to deposit Ga-doped ZnO (GZO) films to minimize acceptor-like crystalline defects. This deposition technique significantly increased the carrier concentration of GZO films. In addition, the impact of partial oxygen pressure on the deposition atmosphere on carrier concentration was remarkably reduced. As a result, the resistivity of the films decreased to as low as 4 × 10−4 Ωcm without the need for intentional substrate heating. Consequently, the deposition with Zn supply shows great potential for producing ZnO-based transparent conducting films with practically low resistivity on polymer substrates that have lower heat tolerance.