Abstract
In spite of the TiO2 compact layer (TCL) being widely used, it still needs more study. This paper took Ni-doped TCLs as the research target, using an innovative two-step method perfectly prepared Ni-doped TCLs with different thicknesses. And then on the basis of Ni-doped TCLs, the TiO2 nanorod array (TNA) films were successfully prepared. The effects of Ni-doped TCLs with different thicknesses on the morphology, structure, and photoelectric performance of TNA films were investigated. The results indicated that Ni-doped TCLs with appropriate thickness can significantly improve performance of TNA films and obtain satisfactory PCE stability with time. Compared with the TNA films based on Ni:TCL5, Ni:TCL10, and Ni:TCL30, the TNA film with Ni:TCL20 exhibited better comprehensive photoelectric performance, the DSSCs based on this TNA film achieved the highest Jsc (10.191 mA cm−2), Voc (0.574 V), PCE (4.42%), and the most excellent PCE stability with time.
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