Abstract

We present a novel method for fabricating polarization-stable oxide-confined single-modeGaAs based vertical cavity surface emitting lasers (VCSELs) emitting at 850 nm using anew soft-lithography nano-imprint technique. A monolithic surface grating is etched in theoutput mirror of the laser cavity using a directly imprinted silica-based sol–gel imprintresist as an etch mask. The opto-electronic performance of these devices is compared toVCSELs fabricated by state-of-the-art electron-beam lithography. The lasers made usingthe soft nano-imprint technique show single-mode TM lasing at a threshold and laser slopesimilar to that of devices made by e-beam lithography. The soft nano-imprint techniquealso enables the fabrication of gratings with sub-wavelength pitch, which avoidsdiffraction losses in the laser cavity. The resulting single-mode VCSEL devices exhibit29% enhanced efficiency compared to devices equipped with diffractive gratings.

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