Abstract
A way of improving near field lithography is proposed, using metallic nanostrips arrangedright above the lithographic channels, between which a dielectric film is used,designed to support the strips and modulate the surface plasmon resonance at themetal/dielectric interface. The dependence of the light transmission in the channels onthe properties of the strip array and dielectric film are studied numerically. Theresults show that the transmission is associated with the width of the strip, thepermittivity of the film and the thicknesses of both. With the optimized structure, notonly is transmission efficiency promoted, but also a uniform field distribution ofgood contrast at the channel exports can be obtained, which is beneficial to thelithography.
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