Abstract

Tantalum-doped TiO2 thin films [(TiO2)1-x(Ta2O5)x, x=0–0.8%] were prepared on fluorine-doped tin oxide (FTO)-coated substrates by sol–gel technology for uses in dye-sensitized solar cells (DSSCs). The effects of Ta content on the growth and properties of the TiO2 thin films were investigated. The crystallization and microstructures of the thin films were examined by X-ray diffraction, scanning electron microscopy, and Brunauer–Emmett–Teller analyses. The performance of DSSCs based on Ta-doped TiO2 thin films was also studied. From the obtained results, the increases in Jsc and Voc may be due to the increased electron concentration of TiO2 thin film and the flat-band potential of the TiO2 shifted by tantalum doping, respectively. The optimum properties of DSSCs of Voc=0.68 V, Jsc=7.84 mA/cm2, FF=45.1%, and η=2.4% were obtained using the Ta-doped TiO2 thin film with x=0.5%.

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