Abstract
Effective improvement in electrical properties of NO passivated SiC/SiO2 interface after being irradiated by electrons is demonstrated. The density of interface traps after being irradiated by 100-kGy electrons decreases by about one order of magnitude, specifically, from 3×1012 cm−2⋅eV−1 to 4×1011 cm−2⋅eV−1 at 0.2 eV below the conduction band of 4H-SiC without any degradation of electric breakdown field. Particularly, the results of x-ray photoelectron spectroscopy measurement show that the C–N bonds are generated near the interface after electron irradiation, indicating that the carbon-related defects are further reduced.
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