Improved dry sliding wear behavior of TA1titanium by low-temperature plasma nitriding by CCPN method

Abstract

Cathodic cage plasma nitriding (CCPN) has been proven a promising technique to improving titanium’s poor wear resistance at a relatively lower temperature. Nonetheless, less attention has been paid to the performance of the treated sample at the cathodic potential by CCPN process, mostly on the sample at the floating potential. It has been demonstrated that a nitrogen diffusion layer is formed other than compound layer at the cathodic potential, which is beneficial to improve the bearing-load capacity and adhesion strength between the modified layer and the substrate. In this study, a cathodic cage in combination with pulsed-biased system has been used to realize nitriding of TA1 titanium at the cathodic potential below 660 °C. The influence of pulsed current and treatment time on the resulting surface microstructure and wear performance when sliding against Si3N4 balls were studied. Results showed that with the increasing pulsed current and prolonged processing time, the nitride layer thickness, hardness and roughness also increase. Additionally, although the anti-wear resistance is considerably improved through nitriding treatment compared to untreated TA1 titanium, and there are still differences between the samples prepared under different nitriding parameters. Lastly, the optimum pulsed current and processing time of the CCPN process that provide the best tribological characteristics are determined.