Abstract
Electron Beam-Physical Vapor Deposition (EB-PVD) is being used in coating component for many applications such as electronic industry for producing nanostructures and ICs coatings. In this work, nanostructured copper was deposited on glass using EB-PVD technique. Surface and elemental characteristics of EB-PVD coatings investigated and evidenced corrosion resistance of nanostructured coatings produced by this technique are higher than Cu sheet in chloride media.
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