Abstract
Metal-oxide-semiconductor capacitors with a tetralayer structure consisting of nickel nanocrystals sandwiched between SiO2 and HfO2 tunnel and Al2O3 cap oxides were fabricated on p-Si substrates. Cross-sectional transmission electron micrographs revealed the formation of nickel nanocrystals having size 5–7 nm. The maximum charge injection capability (ΔVFB ∼ 7.8 V; @ ± 15 V) of nanocrystals was observed for the device RTA annealed at 950 °C for a minute. Charge storage and leakage current characteristics of the nanocrystal memory structures were studied through capacitance–voltage and current–voltage measurements, respectively. The improved retention properties with good thermal stability and endurance properties were also studied.
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