Abstract
A DUV-LED with a graded superlattice electron blocking layer (GSL-EBL) is demonstrated to show improved carrier injection into the multi-quantum well region. The structures of modified EBLs are designed via simulation. The simulation results show the carrier behavior mechanism of DUV-LEDs with a single EBL (S-EBL), graded EBL (G-EBL), and GSL-EBL. The variation in the energy band diagram around the EBL region indicates that the introduction of GSL-EBL is very effective in enhancing carrier injection. Besides, all DUV-LEDs emitting at 280 nm are grown in the high temperature metal organic chemical deposition system. It is confirmed that the optical power of the DUV-LED with the GSL-EBL is significantly higher than that of the DUV-LED with the S-EBL and G-EBL.
Highlights
The wavelength of deep ultraviolet (DUV) light (200–280 nm) is very effective in killing germs.[1]
We investigated the effect of modi ed electron blocking layer (EBL) on DUV-LEDs grown using HT-MOCVD
The transmission electron microscope (TEM) data showed the fullstructure of the DUV-LED with multi-quantum well (MQW) and the EBL
Summary
The wavelength of deep ultraviolet (DUV) light (200–280 nm) is very effective in killing germs.[1]. A DUV-LED with a graded superlattice electron blocking layer (GSL-EBL) is demonstrated to show improved carrier injection into the multi-quantum well region.
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