Improved adaptive backstepping control of MPCVD reactor systems with non-parametric uncertainties

Abstract

This paper presents an improved adaptive backstepping control strategy for a microwave plasma chemical vapor deposition (MPCVD) reactor system. To describe the dynamics of the reactor system, a non-parametric uncertain nonlinear system model with unknown control direction functions is built up. In order to deal with the non-parametric uncertainties of the system, direct adaptive laws are primarily proposed to estimate such uncertainties, which is superior to traditional adaptive backstepping that can only address parametric uncertainties. Moreover, an equivalence transformation of the system is given to address the system unknown control direction functions. By using Lyapunov stability criterion, it can be proved that the target signals (desired temperature, desired pressure, and desired gas flow rates) are tracked by the reactor system outputs with small errors. Finally, simulation results are given to demonstrate the effectiveness of the proposed control method.