Abstract
New photosensitive alkoxyamines have been designed using molecular orbital calculations to improve the selective CO versus NO cleavage. The targeted light-sensitive alkoxyamine is synthesized in one step and its reactivity under UV has been investigated using both ESR and LFP. The ability of this alkoxyamine to control the photopolymerization of n-butyl acrylate is evidenced through a process called nitroxide-mediated photopolymerization NMP(2) . The selected alkoxyamine is finally used to prepare covalently bonded multilayered micropatterns. This original application highlights the high potential of this technique for some specific applications that require spatial control.
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