Abstract
Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lithography has proven to have not only various advantages that other lithographic techniques have but also potential to minimize the limitations of current lithographic techniques. In this review, we summarize current lithography techniques and, furthermore, investigate the nanoimprint lithography in detail in particular focusing on the types of molds. Nanoimprint lithography can be categorized into three different techniques (hard-mold, soft-mold, and hybrid nanoimprint) depending upon the molds for imprint with different advantages and disadvantages. With numerous studies and improvements, nanoimprint lithography has shown great potential which maximizes its effectiveness in patterning by minimizing its limitations. This technique will surely be the next generation lithographic technique which will open the new paradigm for the patterning and fabrication in nanoscale devices in industry.
Highlights
Nanoscale fabrication method with high resolution and large yield has been the prominent research area due to its crucial role in patterning the nanosized devices in array form for various applications, ranging from electronic memory application to biomedical application [1,2,3,4,5,6,7,8,9,10,11,12,13,14,15]
In order to further improve the quality of the fabricated elements, different lithographic techniques have been proposed for different purposes
We summarized the status of current technology for mold fabrication used in nanoimprint lithography (Table 1)
Summary
Nanoscale fabrication method with high resolution and large yield has been the prominent research area due to its crucial role in patterning the nanosized devices in array form for various applications, ranging from electronic memory application to biomedical application [1,2,3,4,5,6,7,8,9,10,11,12,13,14,15]. Based on these two hardening methods, three different types of nanoimprint lithography methods have been suggested in order to achieve high resolution, large-area, and low-cost patterning: soft-mold nanoimprint lithography, hard-mold nanoimprint lithography, and hybrid-mold nanoimprint lithography. We will suggest the future applications for each type of lithography in order to fully understand the current techniques and their potential
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