Abstract
We describe our investigations of the electrophysical properties, phase composition and structure of Al2O3 ceramic particles in coatings formed by electron-beam evaporation of alumina ceramic and modified by implantation of tantalum ions. The ceramic coatings were synthesized in a helium atmosphere in the forevacuum pressure range of 1–10 Pa, at characteristic temperatures of beam target and substrate about 2500 and 250 Celsius, respectively, at a deposition rate of 500 nm/min. Ion implantation was performed using a metal ion source based on a vacuum arc discharge, at pressure of order 10−4 Pa; the mean tantalum ion energy was 90 keV and the implantation doses investigated were 1 × 1016, 5 × 1016, and 1 × 1017 ion/cm2. The original and modified ceramic coating samples were studied using a transmission electron microscopy technique. Measurements of the surface resistivity showed that the treatment of coatings by high-energy tantalum ion implantation leads to increase in specific resistance and decrease in sheet resistance.
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