Abstract

The surface texturization of silicon wafers is a key process in solar cell manufacturing to minimize reflective loss and thus increase current. The chemical route adopted for surface texturization have practical issues such as non-uniform texture, homogeneous agitation during process and the most importantly the high cost of isopropanol (IPA). In order to eliminate the aforementioned issues the manufacturers use commercially available texture additives for the texture process. In this this study we evaluated two commercial additives to achieve uniform texture and thus reduce the surface reflectance. The studies were carried out on 125 x 125 mm mono-crystalline silicon (C-Si) wafers. The wafer reflectivity and texture uniformity were studied. The wafers were then processed to fabricate solar cells and the I-V characteristics of these cells were evaluated.

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