Abstract
In chemically amplified resists, acids catalyze pattern formation reactions with acid diffusion in the presence of quenchers, starting with the initial acid distribution as a boundary condition. Diffusion coefficients have been intensively investigated and reported to depend on the condition of the matrix. In this study, the effect of nonconstant diffusion coefficients was investigated using a simulation based on the reaction mechanisms of chemically amplified extreme ultraviolet resists. It was found that nonconstant diffusion coefficients have a significant impact on the resolution, sensitivity, and image quality (line edge roughness) in 22 nm fabrication.
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