Abstract
Plasma-enhanced atomic layer deposition (PE-ALD) is a promising method to grow conformal, epitaxial films at low temperatures (<300 °C). In this study, PE-ALD was used to deposit high-quality, epit...
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.