Abstract
AbstractSpectroscopic ellipsometry measurement of periodic structures (“scatterometry”) has become a standard method for critical dimension and topography measurement in the integrated circuit industry. As dimensions are reduced, this method may not be adequate for research and process control. Use of immersion mode measurements may extend the usefulness of near UV specular scatterometry. In this paper, we present the first experimental measurements of gratings in water immersion and discuss the issues in achieving improved nano‐topography measurements with this method. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
