Abstract
A phase-resolved reflection-based near-field scanning optical microscopy (NSOM) technique with an original all-fiber configuration is presented. Our system consists of an intrinsically phase-stable common-path interferometer. The reflection from the waveguide input facet or from an integrated fiber Bragg grating is used as the reference beam. This arrangement effectively suppresses the phase drift caused by environmental fluctuations. By raster scanning a silicon atomic force microscope probe, we measure the complex near fields of the propagating and stationary waves in silicon nanowaveguides. Our robust, align-free, cost-effective, and shot-noise-limited near-field imaging technique paves the way for versatile optical characterizations of nanophotonic structures on a chip.
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