Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanning.

Abstract

The development of nanotechnology and nanomaterials has put forward higher requirements and challenges for precision measurement or nanometer measurement technology. In order to cope with this situation, a new type of imaging Mueller matrix ellipsometer (IMME) has been developed. A back focal plane scanning method is designed to make the IMME have the ability to measure multiple incident angles. A two-step calibration method is proposed to ensure the measurement accuracy of IMME. After calibration, the IMME can achieve measurement with wavelengths from 410 nm to 700 nm and incident angles from 0° to 65°. The lateral resolution of the IMME is demonstrated to be 0.8 μm over the entire measurement wavelength range. In addition, a Hadamard imaging mode is proposed to significantly improve the imaging contrast compared with the Mueller matrix imaging mode. Subsequently, the IMME is applied for the measurement of isotropic and anisotropic samples. Experimental results have demonstrated that the proposed IMME has the ability to characterize materials with complex features of lateral micron-distribution, vertical nano-thickness, optical anisotropy, etc., by virtue of its advantages of high lateral resolution and high precision ellipsometric measurement.