Abstract
Uneven illumination is a common problem in practical optical systems designed for machine vision applications, and it leads to significant errors when phase-shifting algorithms (PSA) are used to reconstruct the surface of a moving object. We propose an illumination-reflectivity-focus model to characterize this uneven illumination effect on phase-measuring profilometry. With this model, we separate the illumination factor effectively and consider the phase reconstruction from an optimization perspective. Furthermore, we formulate an illumination-invariant phase-shifting algorithm (II-PSA) to reconstruct the surface of a moving object under an uneven illumination environment. Experimental results show that it can improve the reconstruction quality both visually and numerically.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have