Abstract
Off-axis polarized monopole illumination is applied to a hyper-numerical-aperture (NA) (NA>1) microscopic system. Illumination artifacts due to vector effects are observed, which are asymmetric and depend on illumination conditions. A model based on rigorous coupled wave theory is used to simulate image profiles for dielectric, semiconductor, and metal gratings with different monopole locations and polarization states. A solid immersion lens microscope is used to image different types of samples including MoSi photomask, patterned silicon wafer, and chrome photomask. The experimental images are in good agreement with simulation results.
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