Abstract

Ion Beam Analysis (IBA) which combines Rutherford backscattering (RBS), D(3He,p)4He nuclear reaction analysis (NRA) and chemical etching, is employed to detect the depth profiles of deuterium, titanium and molybdenum in metal hydride films (TiDx/Mo). Using this analysis technique, not only the depth resolutions of better than 70 nm for both Ti and Mo were achieved, but also there is no change in D content after the etching. Both secondary ion mass spectrometer (SIMS) and grazing incidence X-ray diffraction (GIXRD) have been also used to analyze the effect of Ti-Mo interdiffusion on the D concentration.

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