Abstract
Herein, a novel method of photoresist-free micropatterning, i.e., self-sensitive chemical modification (SSCM) photolithography, is developed to prepare micron-sized superconductor fine-pattern arrays and cross-shaped GdBa2Cu3O7-x/YBa2Cu3O7-ẟ heterojunctions. The X-ray diffraction and R-T analysis revealed that the SSCM photolithography did not influence the structural and superconducting electronic properties of the GdBa2Cu3O7-x/YBa2Cu3O7-ẟ heterojunctions. Therefore, the proposed method is well suitable for the microfabrication of multilayer superconductor films and is expected to widen the application horizon of high-quality superconductor junction arrays. Furthermore, the electrical test results of cross-shaped structure demonstrated that the I–V curves of GdBa2Cu3O7-x/YBa2Cu3O7-ẟ heterojunctions are similar to that of DC Josephson effect. The transmission electron microscopy revealed the presence of an intermediate transition layer (~1.2 nm) at the GdBa2Cu3O7-x/YBa2Cu3O7-ẟ interface, which may hamper the transmission of Cooper pairs. These results provide novel insights into the preparation of Josephson junctions and other junction devices.
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