Abstract

The IR absorption spectra of the high-purity commercial silica glasses KU, KV., KUVI, KI, and KS-4V., containing from 10-1 to 103 ppm hydroxyl groups, were measured. Based on the experimental data and quantum-chemical calculations, a new approach to the description of the OH incorporation in the glass network was proposed. Our results suggest that, in high-purity SiO2, the OH groups exist as isolated units, rather than as bonded pairs, and a fraction of the OH groups are hydrogen-bonded to bridging oxygens, in contrast to what was generally believed earlier. A new decomposition of the fundamental OH-stretching band is proposed.

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