Abstract
In this work, we explore the deposition of single-phase and uniform HA coatings on a crystalline silicon surface of microelectronic quality. The used methodology includes an NaOH treatment to produce the silanization of Si surface and a modified biomimetic technique, using sodium silicate solution (SS) as nucleant agent, for apatite-based coating formation. The sodium silicate solution (SS) demonstrated to be effective for the calcium phosphate layer formation, but the treatment can reduce the induction to obtain a uniform surface coating of HA. This suggests that, among the factors that determine nucleation of calcium phosphate on silicon, surface electrical charge could play a key role.
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