Abstract
Abstract Graphene oxide (GO) membranes show good separation performance in membrane distillation processes, which require at least a single-sided hydrophobic surface to resist liquid penetration, but such hydrophobic GO membrane cannot be facilely prepared by conventional wet chemical processes. Here, a pulsed plasma hexamethyldisiloxane (HMDSO) process was investigated, with the highest surface contact angle of 124° obtained. The results demonstrate that a plasma deposition process can provide a proper route to prepare surface-selective hydrophobic GO films, which facilitates their applications for membrane distillation processes and related fields.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
