Abstract
We have terminated the hexagonal (0001) and ( 000 1 ̄ ) surfaces of 6H-SiC with a monolayer of hydrogen by exposing the SiC crystal to pure hydrogen at elevated temperatures. The surfaces exhibit sharp, background-free, and unreconstructed LEED patterns and the photoemission spectra show only bulk-related Si and C components and give no indication of additional unwanted adsorbates. On the Si-terminated (0001) surface, a sharp doublet at 2130 cm −1 with a splitting of 6 cm −1 is observed in surface-sensitive infrared spectroscopy, which is due to monohydride SiH stretching modes. The origin of the splitting is discussed. The hydrogenated surfaces are passivated chemically and electronically. The oxygen uptake is less than 2 at.% after 2-h air exposure without any sign of SiO or CO bond formation. The surface Fermi level is unpinned and exhibits its bulk position on n- and p-type samples.
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