Abstract

The optical, and electrophysical characteristics of hydrogenated silicon oxycarbonitride films synthesized by the plasma enhanced chemical vapor decomposition of the mixtures of 1,1,1,3,3,3-hexamethyldisilazane with oxygen and nitrogen in the temperature range of 373–973 K have been studied. It has been shown that the obtained films are highly transparent (transmittance is ∼92–99%) in the UV, visible, and IR ranges of the spectrum; they have refractive indices in the range of 1.43–2.25, a low reflection coefficient of visible light (nearly 3%), and low dielectric permittivity.

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