Abstract
To improve the thermal stability between aluminide and stainless steel substrate and obtain thermodynamically stable phase of alpha-Al2O3, a new Cr2O3/Al2O3 bipolar oxide barrier was proposed, in which metallic Al was sputtered on the preoxidation coating of electroplated chromium and then oxidizing by oxygen plasma. It was found that Cr2O3 film exhibits P-type semiconducting properties while Al2O3 acts as N-type. Hydrogen discharging plasma was used to simulate the in-pile hydrogen permeation. Raman spectra and atomic force microscopy (AFM) were employed to analyze phase structure and surface morphology. Electrochemical impedance spectroscopy and Mott–Schottky were utilized to qualitatively evaluate effective thickness and the integrity for the oxide film. The depth profile and surface chemical states of involving elements were analyzed by auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS), respectively. The result shows that Cr2O3/Al2O3 bipolar oxides have improved hydrogen permeation resistance and would be a potential candidate for barrier application.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
