Abstract
The effects of hydrogenation on the properties of Zn-doped InP/GaAs heterostructures grown by metalorganic chemical vapor deposition were studied by current-voltage (I-V), deep level transient spectroscopy (DLTS), and photoluminescence. Significant improvements in leakage current and breakdown voltage in InP diodes on GaAs were observed after a 2 h hydrogen plasma exposure at 250 °C. DLTS indicated a corresponding reduction in total trap concentration from ∼6×1014 to ∼3×1012 cm−3 at a depth of ∼1.5 μm below the surface. The Zn dopants were completely reactivated by a subsequent 5 min 400 °C anneal without degradation of the reverse current or reactivation of the deep levels. Anneals in excess of 580 °C were necessary to reactivate the deep levels and degrade the leakage current to their original values, indicating the passivation of threading dislocations by hydrogen, and the existence of a wide temperature window for post-passivation processing.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
