Abstract
Using elastic recoil detection analysis and low energy electron diffraction we have investigated the adsorption process of hydrogen on the Si(111)- 3 × 3 -Ag surface. We find that (1) room temperature adsorption of atomic hydrogen induces a structure transformation from the Si(111)- 3 × 3 -Ag to Si(111)-1 × 1-Ag(H) structures, (2) a saturation coverage of hydrogen is 1.5 monolayer, which almost coincides with the one on a clean 7 × 7 surface, and (3) thermal desorption of hydrogen from the ordered 1 × 1-Ag(H) surface results in the recovery of the original 3 × 3 -Ag surface.
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