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Abstract
Hydrogen incorporation into heavily carbon-doped GaAs grown by metal-organic vapour phase epitaxy using carbon tetrabromide (CBr 4) has been studied. In the base layer of as-grown GaInP/GaAs heterojunction bipolar transistors (HBTs), about 20% of the carbon acceptors are found to be passivated by hydrogen. The outdiffusion of this hydrogen during an ex situ annealing at 450 °C in nitrogen, which is effective for carbon-doped single layers, is blocked by n-type capping layers in HBTs. An in situ annealing step was found to be suitable to reduce the acceptor passivation in HBTs to about 10%.
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