Abstract
Ultrathin amorphous carbon (a-C) films were deposited on Si(100) substrates by low-pressure radio-frequency plasma discharges of varying substrate bias voltage in pure Ar atmosphere. The surface roughness and tribomechanical properties of the a-C films were measured with an atomic force microscope and a surface force microscope, respectively. Insight into tetrahedral (sp3) and trigonal (sp2) atomic carbon hybridization was obtained from the deconvoluted C1s core level peak of X-ray photoelectron spectroscopy spectra. Energetic particle collision theory was used to correlate hybridization and tribomechanical properties to low-pressure plasma discharge conditions. The results are interpreted in the context of Ar+ ion collisions with carbon atoms on the growing film surface, followed by collision cascades between excited carbon atoms and other surface carbon atoms, resulting in the removal of weakly bonded carbon atoms and dominance of sp3 hybridization or the development of thermal spikes that promote sp2 hybridization. Particle collision analysis shows that the sp3 fraction is a function of Ar+ ion flux, sputtering yield of target carbon atoms, and kinetic energy of surface carbon atoms, in good qualitative agreement with experimental results of the sp3 content of a-C films versus substrate bias voltage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.