Abstract
Electrochromic nickel oxide films are of interest in the development of electrochromic devices (“smart windows”) for a variety of applications including architectural and automotive glazings. Structural characterization of NiO films has been performed by Lampert and Agrawal et. al using transmission electron microscopy (TEM), although only in plan view of NiO films which had been deposited on carbon-coated copper grids. However, finer structural features in the NiO electrochromic film and the interface between the NiO film and the indium tin oxide (ITO) layer have not been reported. The purpose of this investigation is to characterize nanometer scale structures in NiO films and the NiO/ITO interface using cross-sectional high resolution electron microscopy (HREM).The NiO films were deposited using a JS-450D rf sputtering coater. A nickel target of 99.9% purity with a 100 mm diameter was used. ITO coated glass with a sheet resistance of 40 ohm/sq. was used as a substrate, and both target and substrate were water cooled and were separated by 50 mm.
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