Abstract
HRTEM is a very powerful tool for structural characterization of materials. However, its role in industry is still very limited and electron microscopy is generally considered as a secondary support technique, although it can uniquely provide microstructural information leading to understanding and improvement of product quality, especially for those materials in the form of films. An example in the semiconductor industry is recendy described by Anderson. He points out that the main concerns of imaging using a conventional cross-section sample preparation method are too small imaged areas, not representative of the product, and artifacts that may be introduced during the ion-milling process. Here we apply HREM to thick film resistors and attempt to overcome these obstacles.
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