Abstract

The graphitic forms of carbon, boron nitride, and carbon nitride grown in energetic film-deposition processes or processed using ion irradiation often possess an in-plane c-axis texture. In this texture the basal planes of the graphitic material are perpendicular to the substrate. We show that the in-plane c-axis texture can be produced through plastic deformation as a mechanism to relieve the large ion-induced compressive stresses in these materials. Specifically, basal-plane slip and kinking processes would produce a rotation of the c-axis towards the plane of biaxial compressive stress. Once the c-axis has rotated to lie in the plane of the substrate, further deformation by basal-plane slip cannot occur. Then, in the absence of additional stress-reduction pathways, the stress level will rise if the material undergoes further compressive elastic strain. The possible relationship between this stress build-up and nucleation of high-density phases, such as cubic boron nitride, is briefly discussed.

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