Hot-carrier-induced time dependent dielectric breakdown in high voltage pMOSFETs

Abstract

We report about the time dependent gate dielectric breakdown failure of high voltage p-channel MOSFETs submitted to hot-carrier stress. We consider the time integral of the instantaneous gate current raised to a constant exponent as a measure of the dielectric film wear out, and we check that this integral computed up to the dielectric failure time is indeed a constant not depending on the drain–source stress bias.