Abstract

The thermalization of hot carriers and phonons gives direct insight into the scattering processes that mediate electrical and thermal transport. Obtaining the scattering rates for both hot carriers and phonons currently requires multiple measurements with incommensurate timescales. Here, transient extreme-ultraviolet (XUV) spectroscopy on the silicon 2p core level at 100 eV is used to measure hot carrier and phonon thermalization in Si(100) from tens of femtoseconds to 200 ps, following photoexcitation of the indirect transition to the Δ valley at 800 nm. The ground state XUV spectrum is first theoretically predicted using a combination of a single plasmon pole model and the Bethe-Salpeter equation with density functional theory. The excited state spectrum is predicted by incorporating the electronic effects of photo-induced state-filling, broadening, and band-gap renormalization into the ground state XUV spectrum. A time-dependent lattice deformation and expansion is also required to describe the excited state spectrum. The kinetics of these structural components match the kinetics of phonons excited from the electron-phonon and phonon-phonon scattering processes following photoexcitation. Separating the contributions of electronic and structural effects on the transient XUV spectra allows the carrier population, the population of phonons involved in inter- and intra-valley electron-phonon scattering, and the population of phonons involved in phonon-phonon scattering to be quantified as a function of delay time.

Highlights

  • The control of ultrafast carrier thermalization and transport processes is increasingly important in nanoscale semiconductor junctions,1 next-generation thermoelectrics,2 and hot carrier solar cells.3 Through extensive optical and electrical characterization, the electron-phonon and phonon-phonon scattering processes have been detailed in Si, Ge, and GaAs for carriers in the lowest-lying conduction and valence valleys.4–6 This information has proven vital for allowing accurate device prediction and modeling through the Boltzmann transport equations.7 the time scale and energy range over which the individual scattering pathways can be tracked are limited by the narrow pump and probe pulse bandwidths required to select specific phonon or electron features

  • A thermal lattice expansion is obtained with kinetics that follow the creation of low-energy, mainly acoustic phonons by intra-valley electron-phonon scattering and phonon-phonon decay processes. These findings suggest that ultrafast pump-probe transient XUV spectroscopy can provide the important carrier and phonon scattering timescales and pathways following photoexcitation in a single set of measurements

  • The transient XUV signal of the silicon 2p L23 edge was analyzed in terms of possible electronic and structural changes following excitation in the D valley

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Summary

INTRODUCTION

The control of ultrafast carrier thermalization and transport processes is increasingly important in nanoscale semiconductor junctions, next-generation thermoelectrics, and hot carrier solar cells. Through extensive optical and electrical characterization, the electron-phonon and phonon-phonon scattering processes have been detailed in Si, Ge, and GaAs for carriers in the lowest-lying conduction and valence valleys. This information has proven vital for allowing accurate device prediction and modeling through the Boltzmann transport equations. the time scale and energy range over which the individual scattering pathways can be tracked are limited by the narrow pump and probe pulse bandwidths required to select specific phonon or electron features. Multi-electron and many-body effects complicate the interpretation and prediction of XUV absorption, making it difficult to separate electronic and structural contributions.40–42 This has so far slowed the use of transient XUV spectroscopy as a single-instrument method for understanding the carrier and phonon thermalization pathways in semiconductors. A thermal lattice expansion is obtained with kinetics that follow the creation of low-energy, mainly acoustic phonons by intra-valley electron-phonon scattering and phonon-phonon decay processes. These findings suggest that ultrafast pump-probe transient XUV spectroscopy can provide the important carrier and phonon scattering timescales and pathways following photoexcitation in a single set of measurements

Experimental
Theoretical
Ground state absorption
Excited state absorption for 800 nm excitation
Electronic contributions to the excited state absorption
Structural contributions to the excited state absorption
Ek dEk dg is the
1–2 Â 1020
QUANTIFYING CARRIER AND PHONON DYNAMICS
Findings
CONCLUSIONS
Full Text
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