Abstract
Oxynitride glasses in the system Y-Al-Si-O-N were used to join sintered and hot-pressed Si{sub 3}N{sub 4} from 1,550{degree} to 1,725{degree}C in a hot isostatic press. The short-bar, chevron-notch method was used to measure the fracture toughness of the joined Si{sub 3}N{sub 4} at room temperature. Joined sintered Si{sub 3}N{sub 4} exhibited high fracture toughness values (4.1 to 5.0 MPa{center dot}m{sup 1/2}) and the joining process was dominated by chemical interactions between the ceramic and bonding glass. Joining of hot-pressed Si{sub 3}N{sub 4} was dominated by flow of glass across the Si{sub 3}N{sub 4} surfaces, and low fracture toughness values ranging from <1.0 to 5.5 MPa{center dot}m{sup 1/2} were observed.
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