Abstract
The holographic recording parameters of amorphous chalcogenide semiconductor (AChS) thin films under optimization depend on hologram type. So, using self-enhancement effect during recording and wet etching after recording enable possibility to decrease recording energy and increase of signal/noise ratio for embossed holograms. Choosing the appropriate light exposure permit us to achieve equal values of diffraction efficiency (DE) for different diffraction orders during fabrication of light splitting holographic optical elements (HOE). Changing film thickness and recording wavelength it is possible to find optimal conditions for high DE holographic gratings readable at infrared region of light.
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