Abstract
A broad technology platform for holographic recording of various infrared diffractive optical elements in semiconductor materials for application in spectral devices, telecom components and lasers is described. The room temperature process of photo-modification of the material refractive index at low light intensity is applied to fabrication of the infrared diffractive optics based on polycrystalline ZnSe and single-crystal GaAs semiconductor materials.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
