Abstract
UV (325 nm) holographic recording of gratings in indium oxide films fabricated by reactive pulsed laser deposition has been investigated as a function of growth temperature, oxygen pressure and angle of incidence of the plasma plume on the substrate. The influence of the ambient environment (air or vacuum) and the film temperature during recording has also been studied. Large steady state refractive index changes up to 6×10-3 were observed in layers grown at an oblique angle of 75°. About 77% of the magnitude of these changes residues after thermal annealing and is attributed to UV-induced permanent structural rearrangements. In contrast, refractive index changes in films grown at normal incidence were smaller in magnitude and completely reversible.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Applied Physics A: Materials Science & Processing
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
