Abstract
A new technique for preparing metal-doped layers using photo-induced metal dissolution and diffusion in chalcogenide glasses is presented. This technique is based on multilayer structures formed by alternating metal (Ag) and chalcogenide (As30S70) layers prepared by vacuum evaporation. Such multilayer structures proved to have higher sensitivity to illumination and a higher photo-dissolution rate in comparison to the conventional bilayer structure Ag/As30S70. The multilayer and bilayer structures were used to fabricate phase gratings by holographic exposure using an Ar+– ion laser. Gratings prepared from bilayer structures showed slightly higher diffraction efficiency compare to those prepared from multilayers.
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