Abstract
The size distributions of hillocks formed on Al and Al alloy films were measured and related to their growth mechanisms. The compositions of these films were as follows: pure Al, Al–1.7wt.%Cu, Al–7.6wt.%Cu, Al– 15wt.%Cu, and Al–1.7wt.%Cu–<1wt.%Si. They were formed under a variety of experimental conditions. In almost all cases the hillock size distributions were log-normal, which, in analogy with the nucleation and growth of thin films, is the distribution that would be expected for hillock growth by mobility coalescence. In the case of the Al–15wt.%Cu films, which were isothermally annealed in vacuum at 300 °C, the distributions gradually changed from log-normal initially to one that had some of the characteristics of Ostwald ripening.
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