Abstract

Indium tin oxide (ITO) is one of the most widely used transparent conductors in optoelectronic device applications. We investigated the optical properties of ITO thin films at high temperatures up to 800 °C using spectroscopic ellipsometry. As temperature increases, amorphous ITO thin films undergo a phase transition at ~ 200 °C and develop polycrystalline phases with increased optical gap energies. The optical gap energies of both polycrystalline and epitaxial ITO thin films decrease with increasing temperature due to electron–phonon interactions. Depending on the background oxygen partial pressure, however, we observed that the optical gap energies exhibit reversible changes, implying that the oxidation and reduction processes occur vigorously due to the low oxidation and reduction potential energies of the ITO thin films at high temperatures. This result suggests that the electronic structure of ITO thin films strongly depends on temperature and oxygen partial pressure while they remain optically transparent, i.e., optical gap energies > 3.6 eV.

Highlights

  • Indium tin oxide (ITO) is one of the most widely used transparent conductors in optoelectronic device applications

  • We observed that a-ITO thin films undergo a phase transition in the annealing process and develop a polycrystalline phase with increased Eg at high temperatures

  • We suggest that strong electron–phonon interaction of poly-ITO thin films is responsible for the temperature dependence of Eg

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Summary

Introduction

Indium tin oxide (ITO) is one of the most widely used transparent conductors in optoelectronic device applications. Depending on the background oxygen partial pressure, we observed that the optical gap energies exhibit reversible changes, implying that the oxidation and reduction processes occur vigorously due to the low oxidation and reduction potential energies of the ITO thin films at high temperatures. Tin-doped indium oxide or indium tin oxide (ITO) is a transparent conductor, which is widely used in modern optoelectronic devices such as thin-film transistors, resistive switching memories, and solar c­ ells[1,2,3,4,5] It is mostly unexplored if its high electrical conductivity and optical transparency will remain intact at extreme conditions such as high temperature or pressure. Our results demonstrate that an unintentional oxygen annealing effect at high temperatures can result in different optical and transport properties of ITO thin films

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