Abstract
The manufacturing implementation of alternating aperture PSM's (AltPSM) has been gated by the impacts these techniques have on reticle manufacturing, specifically reticle defect inspection and repair. Die-to-die inspection techniques have been achieved for some clearfield multiphase alternate phase reticles, but the required die-to-database solutions are not currently available with defect inspection systems. In response to these mask manufacturing issues and IC design layout issues, resolution enhancing techniques based on Darkfield Alternate Phase (DAP) reticle designs are now of growing importance. A DAP Programmed Evaluation Reticle, DAPPER, was fabricated and inspected on a new high numerical aperture ultraviolet reticle inspection system. The results show reasonable defect sensitivity performance in the presence of both reticle geometry and quartz etch topography characteristic of 130-nm node advanced logic circuit DAP reticles.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
