Abstract
Graphitic carbon nitride (CN) is considered to be an attractive material for application in photoelectrochemical (PEC) water splitting cells and photoelectronic devices. However, it is still a challenge to fabricate high-quality CN films. Herein, high-quality CN films have been synthesized via close-spaced thermal copolymerization of dicyandiamide and cyanuric acid for the first time. This method can not only prepare continuous and uniform CN films that grow directly on a conductive substrate but also effectively adjust the film structure (thickness and morphology).
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