Abstract
In this work, an alternative route to fabricating high-quality CH3NH3PbI3 thin films is proposed. Single-source physical vapour deposition (SSPVD) without a post-heat-treating process was used to prepare CH3NH3PbI3 thin films at room temperature. This new process enabled complete surface coverage and moisture stability in a non-vacuum solution. Moreover, the challenges of simultaneously controlling evaporation processes of the organic and inorganic sources via dual-source vapour evaporation and the heating process required to obtain high crystallization were avoided. Excellent composition with stoichiometry transferred from the powder material, a high level of tetragonal phase-purity, full surface coverage, well-defined grain structure, high crystallization and reproducibility were obtained. A PCE of approximately 10.90% was obtained with a device based on SSPVD CH3NH3PbI3. These initial results suggest that SSPVD is a promising method to significantly optimize perovskite CH3NH3PbI3 solar cell efficiency.
Highlights
Organic-inorganic hybrid perovskite based on methylammonium lead halide (MAPbX3, where MA is an organic cation (CH3NH3+), Pb is a divalent metal ion (Pb2+) and X is a halide (I− or Cl−))[1] is currently being widely studied owing to its variety of interesting optical, magnetic and electronic properties[2,3,4]
The raw MAPbI3 crystal with fewer impurities is favourable for the prepared MAPbI3 thin film and solar cells
The MAPbI3 material remains the same. With this single-source physical vapour-deposition (SSPVD) method, MAPbI3 gases are guided to the substrate without undergoing a chemical reaction on the way to the substrate
Summary
Organic-inorganic hybrid perovskite based on methylammonium lead halide (MAPbX3, where MA is an organic cation (CH3NH3+), Pb is a divalent metal ion (Pb2+) and X is a halide (I− or Cl−))[1] is currently being widely studied owing to its variety of interesting optical, magnetic and electronic properties[2,3,4]. The gas phase is transported and deposited back on the surface of the sample This method is different from previous methods such as the one-step spin-coating method, two-step sequential method, vapour-assisted solution process, and dual-source vapour evaporation that have been used to prepare MAPbI3 thin films involving reactions between the organic and inorganic sources. With the SSPVD method, MAPbI3 gases are guided to the sample and do not undergo a chemical reaction on the way to the sample or on the surface of the sample This method effectively avoids the problems such as the high reaction rate between CH3NH3I and PbI2, lack of suitable solvent for CH3NH3I and PbI2, impurities in the precursor solution, dissolution of the perovskite film, need for the simultaneous control of evaporation rates of the organic and inorganic sources, presence of PbI2 impurities, improper heat treatment, and so on. This method produces uniform, smooth, nonporous perovskite thin films with complete surface coverage, a high level of phase purity and good crystallization
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